Please use this identifier to cite or link to this item: http://cmuir.cmu.ac.th/jspui/handle/6653943832/71917
Title: Adsorption of iodinated trihalomethanes onto thiol functionalized ZIF-8s: Active adsorption sites, adsorptive mechanisms, and dehalogenation by-products
Authors: Phacharapol Induvesa
Chalita Ratanatawanate
Aunnop Wongrueng
Patiparn Punyapalakul
Authors: Phacharapol Induvesa
Chalita Ratanatawanate
Aunnop Wongrueng
Patiparn Punyapalakul
Keywords: Environmental Science
Issue Date: 1-Feb-2021
Abstract: © 2020 Elsevier B.V. The adsorptive mechanisms operating in, and the effect of two different thiol modification methods on, the removal of five iodinated trihalomethanes (I-THMs) by the zeolite imidazolate framework (ZIF-8) were investigated in single and mixed solutions. The direct postgrafting of dithioglycol to the zinc complex node of ZIF-8 (ZF-SH) can increase the mesopore structures that enhance inner pore accessibility; this increase is a critical property required for excellent adsorption of I-THMs. The synergetic adsorptive interactions consist of Lewis acid-base interactions via the Zn-Zn complex, ion-dipole interactions involving the protonated hydroxyl and thiol groups, and hydrophobic interactions at the imidazole ring. In contrast to ZF-SH, the (3-mercaptopropyl)-trimethoxy functionalized silica coating on ZIF-8 (ZF-Si-SH) causes a lower thiol moiety and a steric effect that is reflected in its lower adsorption capacity. In both single and mixed solutions, the small molecular size and hydrophobic nature of I-THMs can promote better adsorption capacity on all thiol-modified ZIF-8, while the minus dipole charge distribution of the I-THMs structure plays a more critical role in selective adsorption on pristine ZIF-8. Interestingly, the dehalogenation of triiodomethane to diiodomethane due to a nucleophilic substitution (SN2) reaction can be accelerated by the thiol functionalized silica layer on ZIF-8.
URI: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85091946187&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/71917
ISSN: 18791026
00489697
Appears in Collections:CMUL: Journal Articles

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