Please use this identifier to cite or link to this item: http://cmuir.cmu.ac.th/jspui/handle/6653943832/60407
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dc.contributor.authorT. Dechakupten_US
dc.contributor.authorG. Yangen_US
dc.contributor.authorI. M. Reaneyen_US
dc.contributor.authorC. A. Randallen_US
dc.contributor.authorS. Trolier-McKinstryen_US
dc.date.accessioned2018-09-10T03:42:01Z-
dc.date.available2018-09-10T03:42:01Z-
dc.date.issued2008-12-01en_US
dc.identifier.issn10226680en_US
dc.identifier.other2-s2.0-62949247701en_US
dc.identifier.urihttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=62949247701&origin=inwarden_US
dc.identifier.urihttp://cmuir.cmu.ac.th/jspui/handle/6653943832/60407-
dc.description.abstractThe microstructure and interface quality of chemical solution deposited barium titanate thin films on Ni foil were studied. Cross-sectional transmission electron microscopy shows that a ∼200 nm thick barium titanate film annealed in a controlled oxygen partial pressure consists of equiaxed grains with grain size range of 24-75 nm (∼ 42 nm average). NiO was detected after re-oxidation by X-ray diffraction, but not by transmission electron microscopy, suggesting that the oxide is not a continuous barrier layer, but is spatially distributed in the films. Oxygen non-stoichiometry and the existence of C in barium titanate films were observed by electron energy loss spectrometry. In addition, it was found that there is a 5-8 nm thick Ni-Ba alloy developed at the interface between the barium titanate film and Ni foil. © 2008 Trans Tech Publications, Switzerland.en_US
dc.subjectEngineeringen_US
dc.titleMicrostructure and interfaces of thin film capacitors on base metal foilsen_US
dc.typeBook Seriesen_US
article.title.sourcetitleAdvanced Materials Researchen_US
article.volume55-57en_US
article.stream.affiliationsChiang Mai Universityen_US
article.stream.affiliationsPennsylvania State Universityen_US
article.stream.affiliationsUniversity of Sheffielden_US
Appears in Collections:CMUL: Journal Articles

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