1. CMU Intellectual Repository

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Results 41-50 of 282 (Search time: 0.002 seconds).
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Issue DateTitleAuthor(s)
1-Jan-2020Lead discovery of a guanidinyl tryptophan derivative on amyloid cascade inhibitionPiyapan Suwanttananuruk; Jutamas Jiaranaikulwanitch; Pornthip Waiwut; Opa Vajragupta
1-May-2020Preparation of clindamycin hydrochloride loaded de-esterified low-methoxyl mango peel pectin film used as a topical drug delivery systemTanpong Chaiwarit; Pornchai Rachtanapun; Nutthapong Kantrong; Pensak Jantrawut
6-Jan-2020Investigating Liquid Water Transport in Different Pore Structure of Gas Diffusion Layers for PEMFC Using Lattice Boltzmann MethodM. Sepe; P. Satjaritanun; S. Hirano; I. V. Zenyuk; N. Tippayawong; S. Shimpalee
1-Sep-2020Seasonal variation and sources estimation of PM2.5bound pahs from the ambient air of Chiang Mai City: An all-year-round study in 2017Sawaeng Kawichai; Tippawan Prapamontol; Somporn Chantara; Tinakorn Kanyanee; Wan Wiriya; Yan Lin Zhang
1-Sep-2020Hydrogen sulfide removal from biogas using immobilized sulfur oxidizing bacterium paracoccus versutus CM1 in biofiltersDolruedee Jirachaisakdeacha; Ladapa Kumdhitiahutsawakul; Patiroop Pholchan; Uthen Kantha; Wasu Pathom-Aree; Sakunnee Bovonsombut
1-Sep-2020Determination of particle-bound PAH concentrations within a heavily-trafficked street Canyon in Chiang Mai, ThailandWittaya Tala; Thipsukon Khumsaeng
1-Sep-2020L-lactic acid production by lactobacillus salivarius l105 in optimized medium and effects of sugar concentrationNitaya Boontim; Kridsada Unban; Wasu Pathom-Aree; Piyanuch Niamsup; Chartchai Khanongnuch; Saisamorn Lumyong
1-Sep-2020Preparation of film incorporating spray-dried red cabbage anthocyanin encapsulated with bagasse carboxymethyl celluloseKanjapach Boontranurak; Patcharin Raviyan; Jiraphat Panya; Suphanida Mantana; Suthaphat Kamthai
15-Sep-2020Plasma diagnostic in LiMn<inf>2</inf>O<inf>4</inf> thin film process for Li-ion battery applicationBibhuti B. Sahu; Seok H. Kim; Sehwan Kim; Jeon G. Han; Sunkook Kim
15-Sep-2020Redeposition-free of silicon etching by CF<inf>4</inf> microwave plasma in a medium vacuum process regimeC. Pakpum; D. Boonyawan

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