Please use this identifier to cite or link to this item:
Full metadata record
DC FieldValueLanguage
dc.contributor.authorSurapong Panyataen_US
dc.contributor.authorSukum Eitssayeamen_US
dc.contributor.authorGobwut Rujijanagulen_US
dc.contributor.authorTawee Tunkasirien_US
dc.contributor.authorSumnuk Sirisoonthornen_US
dc.contributor.authorKamonpan Pengpaten_US
dc.description.abstractTitanium-doped indium oxide (ITiO) films were deposited on soda-lime glass by ultrasonic spray pyrolysis. The optimum conditions of deposition parameters, such as dopant concentration for lowest resistivity were investigated. Phase formation and microstructure of the films were examined by XRD and SEM. AFM was used to obtain the surface topology of the prepared films. The optical transmission and resistivity of films were determined by UV-Vis-NIR spectrophotometer and Van der Pauw method respectively. The resistivity of films depended on the titanium content. The feasibility study of using the ITiO as one of the TCO for solar cell was discussed. © 2013 Copyright Taylor and Francis Group, LLC.en_US
dc.subjectMaterials Scienceen_US
dc.subjectPhysics and Astronomyen_US
dc.titlePreparation of titanium-doped indium oxide films by ultrasonic spray pyrolysis methoden_US
article.volume454en_US Mai Universityen_US National Metal and Materials Technology Centeren_US
Appears in Collections:CMUL: Journal Articles

Files in This Item:
There are no files associated with this item.

Items in CMUIR are protected by copyright, with all rights reserved, unless otherwise indicated.